Generation of 2-Micrometer Wavelength Laser-Light to Drive EUV-Emitting Plasmas

Lars Behnke,Yahia Y. Mostafa,Ruben Schupp,Zoi Bouza,Adam Lassise,Muharrem Bayraktar,John Sheil,Ronnie Hoekstra,Wim Ubachs,Oscar O. Versolato

Optica High-brightness Sources and Light-driven Interactions Congress 2022（2022）

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摘要

A laser system based on three-wave mixing is used to generate laser-light at 2-micometer wavelength. This system is used for in-depth studies of the utility of 2-micrometer-driven sources of extreme ultraviolet (EUV) light in Nanolithography.

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