Deposition of metal thin films using a hollow cathode hydrogen discharge

Approximately 30 to 40 years ago the group of Stan Vepřek of the University of Zurich described the fabrication of silicon thin films by formation and decomposition of silicon hydride. In their paper they described how pieces of silicon exposed to a low-pressure hydrogen plasma could promote the formation of a volatile silicon hydride. The hydride was then transported to a hot substrate which caused its thermal decomposition and the formation of the silicon film.