Construction of hierarchically porous metal-organic frameworks via vapor atmosphere etching

Developing a versatile etching strategy for constructing hierarchically porous metal-organic frameworks (HP-MOFs) with anticipated mesopores and micropores remains a crucial scientific challenge in probing the enhanced performance and potential applications of MOF materials. Herein, a universal vapor etching method is implemented to controllably create HP-MOFs. Based on the principle that the concentration of vapor is lower than that of the solution, the etching rate and strength toward MOFs are greatly reduced, enabling us to obtain intermediate products during etching. Using this strategy, a series of desired HP-MOFs with varying metal nodes have been prepared. The resultant HP-MOFs integrate the merits of mesopores (mass transfer facilitation) and micropores (large internal surface area). For the degradation of the nerve agent, dimethyl 4-nitrophenyl phosphate, HP-UiO-66 exhibits better catalytic activity than pristine UiO-66.