P‐72: Student Poster: Highly Uniform Speckle Pattern Created via an Elastomeric Stencil Mask for High‐Precision Digital‐Image‐Correlation Analysis of Substrate‐Stretching Deformation

Digital image correlation(DIC) analysis is rooted in a well‐formed speckle pattern, and the spray technique is widely utilized due to its decent unpredictability. However, there are clear limitations in using the spray technique for high‐precision DIC analysis. Herein we provide a novel approach for creating a speckle pattern using an elastomeric stencil mask with uniformly sized perforations. As a result, not only can the ideal speckle pattern be obtained, but also individual speckle sizes can also be easily changed. Most importantly, the mask can be conformably mounted to a variety of 3‐D curved surfaces, allowing for precise DIC analysis based on the appropriate pattern.