Calculation of coverage and flake size of monolayers grown by chemical vapor deposition technique

Two-dimensional (2D) materials such as transition metal dichalcogenides (TMDs) are prominent candidates to be utilized in integrated circuits. However, growing uniform and large-area 2D materials, specifically monolayers, that can be used in electronic component production is still one of the main challenges for these 2D materials to be incorporated in integrated circuits or other active device applications. The aim of this study is to demonstrate a practical and reliable MATLAB computational method, which calculates the ratio of the chemical vapor deposited monolayers to the whole substrate surface and the maximum area of the deposited flakes. In this study, we used the K-means clustering method to calculate surface coverage where we obtained accuracy of ~96% for the simple test images (single star and hexagonal shapes). For the multi-numbered and distributed shapes example, we achieved higher accuracy of ~98%. We also realized calculation of each flake area with ~99% accuracy indicating the flake with the maximum area. The practical calculation of the surface coverage ratio and flake size will allow for easy identification of the effects of the process parameters during novel material growth, which will pave way for future optoelectronic and electronic devices.