STRUCTURAL-PHASE TRANSFORMATIONS IN MAGNETRON DEPOSITED FILMS OF Ti-Zr-Ni SYSTEMS DURING ANNEALING IN VACUUM

Structural and phase changes in thin films obtained by magnetron sputtering of a target with the composition Ti41Zr38.3Ni20.7 (at.%) were studied under isothermal vacuum annealing in the temperature range from 400 to 800 degrees C. The boundaries of the thermal stability of the phases have been determined. Coatings consisting of a single icosahedral quasicrystalline phase, as well as films consisting of the 2/1 crystal-approximant phase were obtained. The features of the phase transformation of a quasicrystal into an approximant crystal were investigated, and the activation energy of this transformation was determined at a level of 94 kJ/mol. The dependence of the degree of phase transformation on the temperature and duration of annealing has been established.