A “Fraternal Twin” atomic layer deposition process for nickel carboxylate and nickel carbide

Inorganic Chemistry Communications（2022）

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摘要

•The first ALD process of nickel carboxylates with a growth rate of ∼ 1.2 Å/cycle.•A “fraternal twin” atomic layer deposition process for nickel carboxylate and nickel carbide.•A high growth rate (0.8 Å/cycle) of thermal ALD nickel carboxylate because of the.•high reactivity of HCOOH towards Ni(acac)2·(tmeda)•Detailed growth mechanism study for the titled films.

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关键词

Atomic layer deposition,Nickel carboxylate,Nickel carbide,Ni(acac)2·(tmeda),HCOOH

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