Resistive Switching in Memristors Based on Artificially Stacked Chemical-Vapor-Deposited Hexagonal-Boron Nitride

2021 Silicon Nanoelectronics Workshop (SNW)(2021)

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摘要
Vertical nickel-hexagonal boron nitride (hBN)-nickel memristive devices based on mechanically stacked monolayer hBN are fabricated and electrically characterized. The devices reveal threshold resistive switching behavior. Comparative electrical measurements in air and vacuum indicate an influence of the measurement conditions on the cycle-to-cycle variability of the devices.
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关键词
memristors,artificially stacked chemical-vapor-deposited hexagonal-boron nitride,vertical nickel-hexagonal boron nitride,mechanically stacked monolayer hBN,threshold resistive switching behavior,comparative electrical measurements
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