(Allylamino)silanes: Synthesis, Properties, and Prospects of Use in Producing New Materials

Methods for the synthesis and purification of dimethyldi(allylamino)silane, ethyldi(allylamino)silane, and methyltri(allylamino)silane were developed. The individuality and structure of the compounds were confirmed by the data of elemental analysis, IR and 1 H, 13 C, 29 Si NMR spectroscopy. According to tensimetric data, the obtained compounds have sufficient volatility and thermal stability to be used as as precursors in the chemical vapor deposition synthesis of films. The thermodynamic characteristics of the evaporation process were determined. The composition of possible phase complexes and temperature boundaries of their existence in equilibrium with the gas phase were determined by the thermodynamic modeling method. Ethyldi(allylamino)silane can be used to obtain highly transparent films of hydrogenated silicon carbonitride by the plasma-enhanced chemical vapor deposition method.