An easy method to improve efficiency of multi-photon polymerization: Introducing solvents with nonlinear optical absorption into photoresist

•Other than the prevailing methods to manipulated laser parameters and photo-initiators, we propose an innovant method to optimize the efficiency of MPP by introducing NLA solvent in photoresists.•By introducing nonlinear solvent, the laser intensity to trigger the NLA of PI is reduced by 23% (from 155 to 120 GW/cm2). The intensity to induce MPP of photoresist is reduced by 16% from (5.7 to 4.8 TW/cm2).•The promotion on the efficiency of MPA and MPP is found to be a superposition of the NLA of photo-initiators and nonlinear solvents, owing to the enlargement of the PI multi-photon cross section or the more solvated electrons in nonlinear solvents.•An easy method, combing the Z-Scan technique and single-pulse long-focal exposure system, is presented to evaluate the NLA performance and the MPP results of the components in photoresists rapidly.