Sputtering growth of n-GaN cap layer on core-shell GaInN/GaN multiquantum shell/nanowires

A nitride-based light-emitting structure composed of a GaN nanowire core and GaInN/GaN multi-quantum shells (MQSs) is promising for high performance optoelectronic devices. By growing high crystalline quality MQS on the nonpolar (m-plane) sidewall of the nanowires, an improvement of luminous efficiency is expected. For Mg activation in p-GaN under the tunnel junction is a big challenge, in this work, we carried out the sputtering growth of n-GaN capping layer on the tunnel junction/p-GaN/MQS/nanowire structures for the first time. Single crystalline n-GaN was successfully grown mainly on the tip of the nanostructures.