Effects of high temperature annealing on the atomic layer deposited HfO2/β-Ga2O3 (010) interfaceHannah N. Masten,Jamie D. Phillips,Rebecca L. PetersonJournal of Applied Physics(2022)引用 7|浏览5暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要