Advanced Scaling of Enhancement Mode High-K Gallium Nitride-on-300mm-Si(111) Transistor and 3D Layer Transfer GaN-Silicon Finfet CMOS Integration

Han Wui Then,M. Radosavljevic,P. Koirala,N. Thomas,N. Nair,I. Ban, T. Talukdar, P. Nordeen, S. Ghosh,S. Bader, T. Hoff, T. Michaelos, R. Nahm, M. Beumer,N. Desai,P. Wallace, V. Hadagali,H. Vora,A. Oni,X. Weng,K. Joshi,I. Meric, C. Nieva,S. Rami,P. Fischer

2021 IEEE International Electron Devices Meeting (IEDM)(2021)

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摘要
We demonstrate scaling of an enhancement-mode (E-mode) high-k GaN-on-300mm Si(111) NMOS transistor achieving best-in-class performance and figure-of-merits for integrated power electronics and RF mm-wave. Here, we demonstrate many firsts and industry records for GaN-on-Si, including record fT/fMAX of 300/400GHz and transconductance $\mathrm{G}_{\mathrm{M}} > 2100 \mu\...
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关键词
Industries,Radio frequency,Three-dimensional displays,Logic gates,FinFETs,Silicon,Inverters
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