Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly

Balint Meliorisz,Kafai Lai,Ulrich Welling,Hans-Jürgen Stock, Sajan Marokkey, Thomas Muelders, Jing Sha,Chi-Chun Liu,Cheng Chi,Jing Guo, Clifford Osborn,Jaime D. Morillo,Wolfgang Demmerle, Derren N. Dunn

Advances in Patterning Materials and Processes XXXV（2018）

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摘要

This paper presents a design and technology co-optimization (DTCO) study of metal cut formation in the sub-20-nmregime. We propose to form the cuts by applying grapho-epitaxial directed self-assembly. The construction of a DTCO flow is explained and results of a process variation analysis are presented. We examined two different DSA models and evaluated their performance and speed tradeoff. The applicability of each model type in DTCO is discussed and categorized.

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