Performance of Stacked Nanosheet Gate All Around FET’s with EUV Patterned Gate and SheetsIndira Seshadri,Jennifer Church, Prateek Hundekar,Mary Breton,Jingyun Zhang,Eric Miller,Andrew Greene,Julien Frougier, Chris Waskiewicz,Tao Li,Tsung-Sheng Kang,Daniel Dechene,Carl Radens,Stuart Sieg,Veeraraghavan Basker,Nelson Felix,Chris A. MackExtreme Ultraviolet (EUV) Lithography XII（2021）引用 2|浏览30AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
