Electrical transport properties of n- and p- doped InSe: Bulk crystals versus exfoliated layers

Efficient doping of 2D materials, including carrier type, concentration and mobility, is challenging but essential for enabling their future electronic and photonic applications. We are developing substitutional n- and p- doping of InSe semiconductor by introducing Sn and Zn, respectively, in the Bridgman bulk crystal growth. Electrical transport properties of undoped vs. n- and p- doped InSe crystals are compared by conducting Hall measurements on bulk crystals and FET transport measurements on exfoliated thin layers. Undoped InSe is intrinsically n-type in both bulk and thin-film forms, with [n]~3.5E14 cm-3 and mu values of up to 1,400 cm2 V-1 s-1 for thick layers at 300K. Carrier concentration in Sn-doped thick layers increases approximately two-fold, while the corresponding mobility reduces ~2 times at 300 K. Zn-doped InSe shows p- behavior for bulk InSe with [p]~7.9E13 cm-3 and mu~43 cm2 V-1 s-1 at 300 K, which reverts to ambipolar/n- type behavior for thin layers in FET devices.