Characterization of a Commercial Plasma Source with Application to Plasma Etching

Since the early 1970s, the use of plasma etching has become standard in the development of substrates for microelectronics. Recently a number of commercial plasma etching systems have been introduced to the market. However, the systems are not commonly used in industry or in academia since their effectiveness has not be adequately verified in the literature. In this poster, we present spectroscopic measurements of the plasma produced by a commercial plasma etching system in an effort to start this verification process.