AlN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (2)Shuichi Noda,Yuuki Yabuta,Naoko Yamamoto,Ryuichiro Kamei,Sommawan Khumpuang,Shiro HaraThe Japan Society of Applied Physics(2020)引用 0|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要