Fabrication of optical components and micro- and nanofluidic devices in polymers by 172 nm direct photoablation

Complex 3D structures having lateral and depth resolutions of <1 µm and 20 nm, respectively, are fabricated in various polymers, including PMMA, ABS, CR-39, and others, by a direct photoablation process utilizing 172 nm radiation from flat microplasma-driven excimer lamps. The developed process does not require any toxic or photosensitive materials, and, therefore, may be performed outside of a clean room. The fabricated 3D structures may also serve as a master mold for PDMS and the curing of other materials.