[Young Scientist Presentation Award Speech] Admittance Analysis of Defect Creation near Dielectric/Si Interface by Plasma ExposureTomohiro Kuyama, Keiichiro Urabe, Koji EriguchiThe Japan Society of Applied Physics（2021）引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
