Nanoimprint template development by new fabrication method and its application

Nanoimprint lithography, NIL, has been developed for semiconductor lithography technology. Recently three dimensional imprint such as dual damascene pattern fabrication by NIL is proposed. For fine feature templates, double patterning process is proposed for template fabrication. For both application, two or more E-beam writing is required in the template fabrication and the overlay of second writing against first layer is important. In the presentation, we will discuss overlay of E-beam writing in NIL template fabrication.