Changes in band alignment for ALD during annealing at 60C of ALD SiO2 on (InxGa1-x) 2O3 for x= 0.25= 0.74C Fares,M Xian,D Smith,M McCartney,M Kneiß,H Von WEncksternuser-5f8411ab4c775e9685ff56d3(2020)引用 0|浏览2暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要