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排名必读论文期刊顶会热点AI 简史溯源树小脉星探人才迁徙塔尖人才国防情报追踪开源工具智慧手语
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Deposited ALD SiO2 High-k/Metal Gate Interface for High Voltage Analog and I/O Devices on Next Generation Alternative Channels and FINFET Device Structures

Shahab Siddiqui,Murshed M Chowdhury,Maryjane Brodsky,Nilufa Rahim,Min Dai,Siddarth Krishnan,Steve Fugardi,Ernest Wu,Anthony Chou,Shreesh Narasimha,Jinghong Li,Kevin Mcstay,Barry Linder,Edward Maciejewski,Ryan Rettmann,Steven Mittl,Unoh Kwon,Vijay Narayanan,William Henson,Dominic Schepis,Michael Chudzik

ECS Meeting Abstracts（2013）

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