Ultimate EOT Scaling (< 5Aå) Using Hf-Based High-κ Gate Dielectrics and Impact on Carrier MobilityTakashi Ando,Martin M. Frank,Kisik Choi,Changhwan Choi,John Bruley,Marinus Hopstaken,Matthew Copel,Richard Haight,Hiroaki Arimura,Heiji Watanabe,Vijay NarayananECS Meeting Abstracts(2010)引用 0|浏览3暂无评分摘要Abstract not Available.更多查看译文AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要