NiSi2 as a bottom electrode for enhanced endurance of ferroelectric Y-doped HfO2 thin filmsJoel Molina-Reyes,Takuya Hoshii,Shun-Ichiro Ohmi,Hiroshi Funakubo,Atsushi Hori,Ichiro Fujiwara,Hitoshi Wakabayashi,Kazuo Tsutsui,Kuniyuki KakushimaJapanese Journal of Applied Physics(2020)引用 2|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要