Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering

Zhilei Sun,K E Evdokimov, M E Konishchev, O S Kuzmin,V F Pichugin

Journal of Physics: Conference Series(2019)

引用 1|浏览0
暂无评分
摘要
Abstract The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.
更多
查看译文
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要