Donald Charlton Bradley. 7 November 1924—20 December 2014

Don Bradley was a twentieth-century pioneer of inorganic chemistry. He opened up the field of metal alkoxides and defined the parameters controlling the aggregative and volatility properties of this class of compounds that later dictated their use as precursors for fabrication of metal oxide thin films. His legacy also included seminal contributions to our knowledge of structure and bonding in the compound classes of metal amides and metal imides. He made highly innovative contributions in the field of metal organic chemical vapour deposition (MOCVD) fabrication of III/V semiconductor thin films, both through synthesis of single source precursors and through synthesis of molecular vehicles for safe storage and delivery of pyrophoric precursors. A modest, witty and gentle man of great intellectual depth and generosity, he nurtured and encouraged the fledgling talent of his students and co-workers and enthusiastically incorporated new developments in terms of experimental and theoretical tools to provide ever deeper understanding. He was relentless in giving his time and effort to support his college, Queen Mary, and the University of London as well as scientific organizations such as the Royal Society, Royal Institution and Royal Society of Chemistry, performing a range of society- or divisional-level official roles at various times, and he even made time for board of governor roles in schools. Don was held in the highest of esteem by his friends and family, students, colleagues and fellow scientists from across the world.