74-3: Multicolor 1250 ppi OLED Arrays Patterened by Photolithography

Pawel E. Malinowski,TungHuei Ke,Atsushi Nakamura,Peter Vicca, Magalie Wuyts, Danli Gu,Sören Steudel,Dimitri Janssen,Yoshitaka Kamochi,Ichiro Koyama,Yu Iwai,Paul Heremans

SID Symposium Digest of Technical Papers（2016）

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摘要

In this paper, we demonstrate multicolor OLEDs patterned sideby-side by photolithography. 1250 ppi arrays with 10 μm subpixel pitch are shown. The chemically amplified, i-line photoresist enables submicron pitch and aperture ratio above 60%. OLED photolithography paves the road to cost-effective, full-color displays with 4K and 8K resolution.

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