Nonvolatile Flash Memory Device Using Ge Nanocrystals Embedded in HfAlO High-<tex>$kappa$</tex>Tunneling and Control Oxides: Device Fabrication and Electrical Performance

J.H. Chen,Y.Q. Wang,W.J. Yoo,Y.-C. Yeo, G. Samudra, D. Chan,A.Y. Du, D.-L. Kwong

IEEE Transactions on Electron Devices(2004)

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