Optimizing Emitter Diffusion Process for Atmospheric Pressure Dry Nanotextured Monocrystalline PERC

Ahmed Ridoy, Nabeel Khan,Bishal Kafle,Stefan Schmidt,Laurent Clochard,Marc Hofmann,Jochen Rentsch

IEEE Journal of Photovoltaics（2022）

引用 3|浏览1

暂无评分

摘要

In this article, we present an optimization of the emitter diffusion for nanotextured p-type monocrystalline silicon solar cells using atmospheric pressure dry etching (ADE) in conjunction with a post-ADE short acidic etch in a passivated emitter and rear cell (PERC) architecture. The optimization of the phosphorus oxychloride diffusion process was realized by first investigating ...

查看译文

关键词

Surface treatment,Surface texture,Computer architecture,Temperature measurement,Optimization,Microprocessors,Photovoltaic cells

AI 理解论文

溯源树

样例

生成溯源树，研究论文发展脉络

Chat Paper

正在生成论文摘要