Chemical structure and functional properties of amorphous boron carbonitride films

We report a comprehensive study of the effect of the chemical structure of boron carbonitride films on the variability of their functional characteristics. The BC x N y films are prepared on Si(100) and fused silica substrates by reactive magnetron sputtering of a B 4 C target in an argon/nitrogen mixture. The deposition rate, elemental composition, and types of chemical bonds in the films is studied depending on the nitrogen content in the gas mixture. Optical (refractive index, transmission coefficient, band gap) and mechanical (hardness, Young′s modulus, substrate adhesion) characteristics are investigated depending on the deposition parameters and the chemical structure of the films. Particular attention is paid to the surface properties of the BC x N y films (morphology, roughness, contact angle, and surface free energy). Stability of the BC x N y films upon storage in air is studied for the first time. The data obtained for the composition, structural characteristics, and some functional properties of the BC x N y films are compared with those reported in literature.