Electron Beam Mask Writer EBM-8000P for High-throughput Mask Production

Tomohiro Iijima,Satoshi Nakahashi, Ryo Iikubo, Takahiro Honbu,Shinsuke Nishimura, Syoji Mori, Hirohiko Honda, Tsuyoshi Yamashita, Tetsurou Nishiyama, Osamu Kawami,Takao Tamura,Kenji Ohtoshi,Hirokazu Yamada

NOVEL PATTERNING TECHNOLOGIES FOR SEMICONDUCTORS, MEMS/NEMS AND MOEMS 2020（2020）

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Key words

electron beam mask writer,throughput,CD uniformity,image placement,node

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