Titanium - Carbon Multilayer Nanostructures Obtained By Thermionic Vacuum Arc Method

Titanium- Carbon (Ti-C) multilayer nanostructures were deposed by Thermionic Vacuum Arc (TVA) technology. The layers consisting of about 100 nm Carbon base layer and seven 40 nm alternatively Ti and C layers were deposed on Silicon substrates. The thickness of such a multilayer structure was up to 500 nm. On the other hand, in order to obtain Ti-C multilayer structures with various Ti content, a 20nm thick C layer was first deposed on Si substrate and then seven successively Ti-C layers (Ti and C simultaneously deposed), each of these having a thickness of up to 40 nm were deposed. To perform the successively Ti-C layers with various Ti content were changed the discharge parameters for C and Ti plasma sources to obtain the desirable Ti atomic concentration To characterize microstructure properties of as prepared C-Ti multilayer structures were used Rutherford Backscattering Spectrometry (RBS), Electron microscopy techniques (TEM, STEM), Raman Spectroscopy and electrical measurements.