A Promising Solution to Reduce Plasma Induced Damage (PID) of High Density Plasma (HDP) Oxide Without Sacrificing the Gap-Fill and Throughput Performance — Chin-Tsan Yeh
2017 JOINT INTERNATIONAL SYMPOSIUM ON E-MANUFACTURING AND DESIGN COLLABORATION (EMDC) & SEMICONDUCTOR MANUFACTURING (ISSM)（2017）
关键词
plasma induced damage,high density plasma,silicon-rich oxide,gate oxide breakdown
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