Enabling Faster VSB Writing of 193i Curvilinear ILT Masks That Improve Wafer Process Windows for Advanced Memory Applications
PHOTOMASK TECHNOLOGY 2020（2020）
关键词
Photomask,GPU,Inverse Lithography Technology,ILT,Curvilinear ILT,Mask Wafer Co-Optimization (MWCO),Multi-beam Mask Writer,VSB Mask Writer,MDP,MPC
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