Impact of Nanosecond Laser Anneal on PVD Ru Films

D. Sil,Y. Sulehria,O. Gluschenkov, T. Nogami, R. Cornell,A. Simon, J. Li,J. Demarest,B. Haran,C. Lavoie,J. Jordan-Sweet,V. Stanic, J. Liu,K. Huet,F. Mazzamuto

2021 IEEE International Interconnect Technology Conference (IITC)（2021）

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摘要

A novel nanosecond (ns) laser anneal (multiple laser shots at sub-melting low laser energy) was employed to reduce the blanket sheet resistance of Ru thin films deposited by physical vapor deposition (PVD). The laser anneal was conducted after PVD Ru deposition and then followed up with a standard 400°C anneal in a forming gas environment. Blanket sheet R decreased by 30% for the laser + furnace a...

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关键词

Resistance,Laser theory,Annealing,Thermal factors,Films,Furnaces,Conferences

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