1-Kev Emission From Laser-Plasma Source Based On An Xe/He Double Stream Gas Puff Target

Characterization of Xe emission in the spectral range between 1 and 1.5 keV is presented in the case when the laser-plasma is generated by nanosecond laser pulse irradiation of a double stream Xe/He gas-puff target. Gas target density was estimated using extreme ultraviolet (EUV) radiography. Emission spectral characteristics in the wavelength range from 0.8 to 5.2 nm were determined by using a flat field SXR spectrometer. Significant emission was recorded in two high-energy bands, the first one at wavelengths 0.8-1.6 nm (photon energy range 0.78-1.5 keV) and the second one at 1.6-2.5 nm (0.5-0.78 keV). Both plasma size and photon yield in each band were measured separately to individually assess radiation and source characteristics. Moreover, a proof-of-principle experiment for near-edge X-ray absorption fine structure spectroscopy of metallic sample near the L-2,L-3 absorption edge was performed to show one of the applicability areas of such a compact source. (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement