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Electromigration Improvement by Graphene on Cu Wire for Next Generation VLSI

Y. T. Hung, J. Z. Huang,H. H. Chang,K. P. Huang,O. H. Lee, W. L. Chiu, H. J. Jian,K. C. Huang, W. C. Lo,J. S. Hu,C. Wu

International Conference on Electronics Packaging(2021)

Cited 1|Views5
Key words
electromigration,damascene,graphene capping layer,nanotwinned Cu
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