Oxygen Recombination Probability Data for Plasma-Assisted Atomic Layer Deposition of SiO2 and TiO2

Karsten Arts, Sanne Deijkers,Riikka L. Puurunen,Wilhelmus M. M. Kessels,Harm C. M. Knoops

Journal of Physical Chemistry C（2021）

引用 8|浏览9

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摘要

Atomic layer deposition (ALD) can provide nanometer-thin films with excellent conformality on demanding three-dimensional (3D) substrates. This also holds for plasma-assisted ALD, provided that the...

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