Admittance Analysis of Plasma-induced Defects in SiN Films Introduced by Plasma Exposure Using a Distributed Bulk-dielectric Trap ModelTomohiro Kuyama, Keiichiro Urabe, Koji EriguchiThe Japan Society of Applied Physics（2021）引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
