Photomixing Thz Generation From Nitrogen-Ion-Implanted Gaas Metal-Semiconductor-Metal Diodes Enhanced By A Bragg Mirror

2020 45TH INTERNATIONAL CONFERENCE ON INFRARED, MILLIMETER, AND TERAHERTZ WAVES (IRMMW-THZ)(2020)

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摘要
We demonstrate that a nitrogen-implanted GaAs can be successfully implemented as a tunable, THz frequency range photomixer, optimized for the best performance for optical excitation in the 760-800 nm range. The latter was obtained by fabricating a metal-semiconductor-metal diode on top of a Bragg mirror structure and resulted in a clear enhancement of the THz radiation emission in photomixing experiments.
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nitrogen-ion-implanted GaAs metal-semiconductor-metal diodes,frequency range photomixer,metal-semiconductor-metal diode,THz radiation emission,photomixing,Bragg mirror structure,optical excitation,size 760.0 nm to 800.0 nm,GaAs:N
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