Drastic reliability improvement using H2O2/UV treatment of HfO2 for heterogeneous integration

S.M. Kim, T.M.H. Nyugen, J.W. Oh,Y.S. Lee,S.C. Kang, H.I. Lee,C.H. Kim,S. Some,H.J. Hwang,B.H. Lee

2021 IEEE International Reliability Physics Symposium (IRPS)（2021）

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摘要

For heterogeneous integration, the heat cycle constraint limits the available number of options for the process of fabricating high-quality reliable high-k dielectrics, for example, post-deposition annealing and high-temperature deposition. To solve this problem, we examine the effects of H2O2/UV treatment on the reliability characteristics of low-temperature-grown HfO2 via atomic layer deposition...

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关键词

Heating systems,Annealing,Oxidation,Dielectrics,Hafnium compounds,Dielectric breakdown,Reliability

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