Fast Implicit Active Contour Model For Inverse Lithography

We combine the ideas from level-set methods in computer vision and inverse imaging to derive a generalized active contour model for inverse lithography problems endowed with a locally implemented semi-implicit difference scheme. We introduce a cognitive analogy to move an initial guess of the interesting pattern contour by image-driven forces to the boundaries of the desired layout pattern. We develop an efficient semi-implicit numerical scheme implemented in the vicinity of the zero level-set and apply additive operator splitting (AOS) with respect to coordinate axes to solve consecutive one-dimensional linear systems of equations with the Thomas method. We demonstrate with simulation results that computation and convergence efficiency are jointly improved with reduced optimization dimensionality and a sufficient large step-size. (C) 2021 Optical Society of America under the terms of the OSA Open Access Publishing Agreement