Distortion Correcting Method When Testing Large-Departure Asphere

With the increase in numerical aperture, the aspheric departure is also increasing in the high-NA projection objective. It is a problem to test the large-departure asphere in nanometers in the optical metrology. For an asphere with aspheric departure exceeding 500 micrometers, firstly, we design a CGH to satisfy the demands of high precise testing and etching fabrication. Secondly, the imaging distortion and the effect of distortion on aberration are analyzed quantitatively. The analysis results show that the maximum magnification deviation is 2. 7:1 for the different radial positions, and the low order aberrations will generate high order aberrations obviously. Lastly, we propose the ray trace and least square method to correct the imaging distortion when testing large-departure asphere with CGH, and verify the precision of the method through the experiments. The results show that the relative residue is less than 0. 2% after correcting, and the precision will satisfy the demands of high precise optical testing and fabrication.