Preparation Of Non-Stoichiometric Al2o3 Film With Broadband Antireflective By Magnetron Sputtering

Al2O3/MgF2 bilayer antireflection film was deposited on the glass with magnetron sputtering. The results indicate that the O:Al ratio of Al2O3 films varied between 1.92:1 and 2.31:1, was higher than the normal stoichiometric ratio of 1.5:1. Al2O3 films were amorphous, and particles with different sizes and quantities were distributed on the surface. The lowest refractive index of Al2O3 film was 1.421, and the average transmittance of coated glass reached 94.10%. The average transmittance within 300-1100 nm of the bilayer film coated glass reached 95.13%. Moreover, Al2O3/MgF2 coated glass enhanced photoelectric conversion efficiency of GaAs solar cell by 4.07%.