Effect of post annealing on properties of N-doped TiO2 films deposited by reactive magnetron sputtering

The paper studies the effect of annealing on the structure and properties of N-doped TiO2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.