Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

Liang Tian, Ivane Bottala-Gambetta, Victor Marchetto, Manoël Jacquemin,Alexandre Crisci,Roman Reboud,Arnaud Mantoux,Gregory Berthomé,Frédéric Mercier,André Sulpice,Laetitia Rapenne,François Weiss,Carmen Jiménez,Elisabeth Blanquet

Thin Solid Films（2020）

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摘要

•Plasma enhanced atomic layer deposition (PEALD) of niobium nitride (NbN) films.•PEALD at 300°C using supercycles leads to carbon-free NbN films.•Supercycles consist in using a H2 plasma followed by a thermal reaction with NH3.•Tc of annealed PEALD NbN films increases up to 13.8 K.

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关键词

Atomic layer deposition,Niobium nitride,Plasma,Thin film,Superconducting properties

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