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Development of silicon nitride films for gate dielectric applications

D Brady,VHC Watt,A Karamcheti,G Bersuker, S Kim,L Vishnubhotla, P Zietzoff, M Gilmer,J Guan,K Torres,B Nguyen, G Williamson, G Brown,G Gale, M Jackson,HR Huff

ELECTROCHEMICAL SOCIETY SERIES（1999）

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