Assessment of Local Variability by High-Throughput E-Beam Metrology for Prediction of Patterning Defect Probabilities
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXII（2018）
关键词
stochastics,LCDU,fat-tail,patterning defects,e-beam,patterning fidelity,holistic lithography
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