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Optimization of the Melt/crystal Interface Shape and Oxygen Concentration During the Czochralski Silicon Crystal Growth Process Using an Artificial Neural Network and a Genetic Algorithm

Xiaofang Qi,Wencheng Ma,Yifan Dang, Wenjia Su,Lijun Liu

Journal of Crystal Growth（2020）

Cited 30|Views0
Key words
Czochralski silicon,Melt/crystal interface shape,Oxygen concentration,Artificial neural network,Genetic algorithm
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